Bernd Tollkühn und Andreas Erdmann - Info zur Person

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smartfun.de

Authors: Bernd Tollkühn, Tim Fühner , Daniela Matiut, Andreas Erdmann, Armin Semmler, Bernd Küchler, Gabriella Kókai Methodology and practical

Machine Learning for Mask Synthesis and VerificationThe Chinese University of Hong Kong

www.cse.cuhk.edu.hk

von H Yang — Andreas Erdmann, Tim Fuehner, Thomas Schnattinger, and Bernd Tollkuehn. Toward au- tomatic mask and source optimization for optical lithography.

半導体リソグラフィーにおけるレジストモデルの線形方程式への ...国立情報学研究所

tsukuba.repo.nii.ac.jp

von 木村泰己 · — [10] Daniela Matiut, Andreas Erdmann, Bernd Tollkuehn, and Armin Semmler. New models for the simulation of post-exposure bake of chemically amplifed resists ...

Bernd TollkühnDBLP

dblp.org

List of computer science publications by Bernd Tollkühn Tim Fühner, Andreas Erdmann , Richárd Farkas , Bernd Tollkühn, Gabriella Kókai:

Automatic resist parameter calibration procedure for lithography...

spie.org

Author(s): Bernd Tollkuehn; Max J. Hoepfl; Andreas Erdmann; Stefan Majoni; Marion Jess

Genetic Algorithms to Improve Mask and Illumination ...Springer

link.springer.com

von T Fühner · · Zitiert von: 29 — Tim Fühner, Andreas Erdmann & Bernd Tollkühn. Department of Computer Science II, University of Erlangen-Nuremberg, Erlangen, Germany.

Lithography for Semiconductor Manufacturing II | (2001) |...

spie.org

Author(s): Andreas Erdmann; Wolfgang Henke; Stewart A. Robertson; Ernst Richter; Bernd Tollkuehn; Wolfgang Hoppe

Alle Infos zum Namen "Bernd Tollkühn"

Bernd Tollkühn - researchr alias

researchr.org

Publications by 'Bernd Tollkühn' ... in Lithographic Imaging SystemsTim Fühner, Andreas Erdmann, Richárd Farkas, Bernd Tollkühn, Gabriella Kókai.

Automatic resist parameter calibration procedure for ...SPIE Digital Library

www.spiedigitallibrary.org

von B Tollkuehn · · Zitiert von: 7 — Bernd Tollkuehn, Max J. Hoepfl, Andreas Erdmann, Stefan Majoni, Marion. Jess, "Automatic resist parameter calibration procedure for lithography. von A Erdmann · · Zitiert von: 15 — Andreas Erdmann, Richard Farkas, Tim Fuehner, Bernd Tollkuehn, Gabriela. Kokai, "Mask and source optimization for lithographic imaging systems," Proc.