Michael Kubis und Paul Hinnen - Info zur Person

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Model-based metrology of resist patterns in lithography

opg.optica.org

von A den Boef · — Arie den Boef, Hugo Cramer, Paul Hinnen, Henry Megens, Michael Kubis, Maurits van der Schaar, Kaustuve Bhatacharrya, and Noelle Wright. Author Information ... › abstract

OSA | Model-based metrology of resist patterns in lithography

opg.optica.org

Arie J. den Boef, Hugo Cramer, Paul Hinnen, Henry Megens, Michael Kubis, Maurits van der Schaar, Kaustuve Bhattacharyya, and Noelle Wright.

Driving imaging and overlay performance to the limits with advanced...

spie.org

Paul Hinnen, ASML Netherlands B.V. (Netherlands) Michael Kubis, ASML Netherlands B.V. (Netherlands) Marcel Beems, ASML Netherlands ...

Integrated scatterometry for tight overlay and CD control to enable...

spie.org

Hugo Cramer, ASML Netherlands B.V. (Netherlands) Michael Kubis, ASML Netherlands B.V. (Netherlands). Paul Hinnen, ASML Netherlands ...

Integrated scatterometry for tight overlay and CD control to enable...

research.utwente.nl

· Jos Benschop, Andre Engelen, Hugo Cramer, Michael Kubis, Paul Hinnen, Hans Van Der Laan, Kaustuve Bhattacharyya, Jan Mulkens.

Alle Infos zum Namen "Michael Kubis"

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Michael Kubis und Paul Hinnen Person-Info

Model-based metrology of resist patterns in lithography

OSA | Model-based metrology of resist patterns in lithography

Driving imaging and overlay performance to the limits with advanced...

Integrated scatterometry for tight overlay and CD control to enable...

Integrated scatterometry for tight overlay and CD control to enable...

Alle Infos zum Namen "Michael Kubis"