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Xing: Frank Barkusky
Dr. / R&D / Project Manager / Göttingen / Materialwechselwirkung) und der Materialphysik und -metrologie (Mikroskopie, besonders im EUV-Vakuumbereich. Erfahrungen im optischen Design (ZEMAX) und mechanischer Konstruktion (SolidWorks)., EUV-Metrologie, Interferometrie, FTIR, AFM, Optik und Messtechnik. Spezialwissen im Bereich des EUV-Spektralbereiches (Plasmaerzeugung, Projektmanagement
Applications of Compact Laser‐Driven EUV/XUV Plasma ...Wiley Online Library
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von A Bayer · Zitiert von: 24 — Frank Barkusky,. Frank Barkusky. Laser-Laboratorium Göttingen e.V.Göttingen, Germany llg-ev.de · Search for more ... von A Bayer · Zitiert von: 24 — Frank Barkusky,. Frank Barkusky. Laser-Laboratorium Göttingen e.V.Göttingen, Germany llg-ev.de · Search for more ...
(12) 发明专利googleapis.com
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Frank Barkusky et al..Direct. (54)发明名称. 一种极紫外辐照材料测试系统. (57)摘要. 本发明公开了一种极紫外辐照材料测试系. 统,EUV 光源室用于容纳EUV 光源,EUV 光源用 ... Frank Barkusky et al..Direct. (54)发明名称. 一种极紫外辐照材料测试系统. (57)摘要. 本发明公开了一种极紫外辐照材料测试系. 统,EUV 光源室用于容纳EUV 光源,EUV 光源用 ...
Geschäftsbericht Laser-Laboratorium Göttingen e.V.YUMPU
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— Frank Barkusky:. Erzeugung intensiver EUV-Strahlung und deren Wechselwirkung mit Materie, Dissertation,. Universität — Frank Barkusky:. Erzeugung intensiver EUV-Strahlung und deren Wechselwirkung mit Materie, Dissertation,. Universität ...
EUV damage threshold measurements of Mo/Si multilayer ...Springer
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von M Müller · · Zitiert von: 18 — Frank Barkusky,; Torsten Feigl & … Klaus Mann. Show authors ... Frank Barkusky. Authors. Matthias Müller. View author publications. von M Müller · · Zitiert von: 18 — Frank Barkusky,; Torsten Feigl & … Klaus Mann. Show authors ... Frank Barkusky. Authors. Matthias Müller. View author publications.
Ablation of Polymers by Focused EUV Radiation From a ...Amanote Research
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Ablation of Polymers by Focused EUV Radiation From a Table-Top Laser-Produced Plasma Source by Frank Barkusky, Armin Bayer, Klaus Mann published in. Ablation of Polymers by Focused EUV Radiation From a Table-Top Laser-Produced Plasma Source by Frank Barkusky, Armin Bayer, Klaus Mann published in.
Emerging Lithographic Technologies X | (2006) | PublicationsSPIE, the international society for optics and photonics
spie.org
... Frank Barkusky, Armin Bayer, et al. Show abstract. We report on design, testing and first applications of an integrated EUV source and beam delivery system Frank Barkusky, Armin Bayer, et al. Show abstract. We report on design, testing and first applications of an integrated EUV source and beam delivery system ...
CN B - 一种极紫外辐照材料测试系统Google Patents
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Non-Patent Citations (2). Title. Direct structuring of solids by EUV radiation from a table-top laser produced plasma source;Frank Barkusky et al.;《Proc. of ... Non-Patent Citations (2). Title. Direct structuring of solids by EUV radiation from a table-top laser produced plasma source;Frank Barkusky et al.;《Proc. of ...
Active beam control for the EUV/XUV spectral range using ...SPIEDigitalLibrary.org
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von A Bayer · · Zitiert von: 1 — ... Frank Barkusky, Stefan Döring, Bernhard Flöter, Christian Peth, Klaus Mann. Author Affiliations +. Armin Bayer,1Frank Barkusky,1 Stefan Döring,1 Bernhard ... von A Bayer · · Zitiert von: 1 — ... Frank Barkusky, Stefan Döring, Bernhard Flöter, Christian Peth, Klaus Mann. Author Affiliations +. Armin Bayer,1Frank Barkusky,1 Stefan Döring,1 Bernhard ...
Erzeugung intensiver EUV-Strahlung und deren ...Bookbot.at
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Das Buch ist derzeit nicht auf Lager. Erzeugung intensiver EUV-Strahlung und deren Wechselwirkung mit Materie. Autoren. Frank Barkusky. Parameter. Das Buch ist derzeit nicht auf Lager. Erzeugung intensiver EUV-Strahlung und deren Wechselwirkung mit Materie. Autoren. Frank Barkusky. Parameter.
KLA-Tencor | Authors | PublicationsAI Chat for scientific PDFs | SciSpace
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EUV damage threshold measurements of Mo/Si multilayer mirrors · Matthias J. Müller, Frank Barkusky 1, Torsten Feigl, Klaus Mann• Institutions (1). KLA-Tencor 1. EUV damage threshold measurements of Mo/Si multilayer mirrors · Matthias J. Müller, Frank Barkusky 1, Torsten Feigl, Klaus Mann• Institutions (1). KLA-Tencor 1.
The Working Group Meeting of the COST Action MP microbeam.eu
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Frank Barkusky. Damage and ablation of optical materials under focused EUV radiation. Yevhen Zabila. Direct laser interference patterning of magnetic films. Frank Barkusky. Damage and ablation of optical materials under focused EUV radiation. Yevhen Zabila. Direct laser interference patterning of magnetic films.
Volume Table of ContentsSPIEDigitalLibrary.org
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... Frank Barkusky, Armin Bayer, Christian Peth, Klaus Mann. Proceedings Volume Damage to VUV, EUV, and X-Ray Optics II, D (2009) https://doi.org Frank Barkusky, Armin Bayer, Christian Peth, Klaus Mann. Proceedings Volume Damage to VUV, EUV, and X-Ray Optics II, D (2009) https://doi.org
Verhandlungen der Deutschen Physikalischen Gesellschaft
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18:30, O , EUV/XUV-Radiation: a New and Versatile Tool for Structural and Chemical Surface Analysis — •Armin Bayer, Frank Barkusky, Stefan Döring, ...
Damage to VUV, EUV, and X-ray Optics; Proceedings of SPIE-The...
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Damage to VUV, EUV, and X-ray Optics; Proceedings of SPIE-The International Society for Optical Engineering; vol.6586掌桥科研已收录Damage to VUV, EUV, and X-ray...
Spotlight on Optics
opg.optica.org
Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source. Frank Barkusky, Armin Bayer, Stefan ...
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