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[PDF] Anisotropy of the resistivity and charge-carrier sign in ...dial.uclouvain.be › boreal: › datastream › PDF_01 › view

dial.uclouvain.be

AP · Eklund, J. Emmerlich, H. Högberg, T. Meehan,. P. Finkel, M. W. Barsoum, J. D. Hettinger, L. Hultman, and S. E..

Defect-engineered (Ti,Al)N thin filmsbooks.google.com › books

books.google.com

H. Högberg, L. Hultman, J. Emmerlich, T. Joelsson, P. Eklund, J. M. MolinaAldareguia, J. P. Palmquist, O. Wilhelmsson, and U. Jansson, ...

Plasma Science and Technology for Emerging Economies: An AAAPT...

books.google.hr

13, 371–374 (2004) P. Eklund, J. Emmerlich, H. Hogberg, O. Wilhelmsson, P. Isberg, J. Birch, R.O.A. Persson, U. Jansson, L. Hultman, Structural, electrical, and ...

Synthesis and characterization of magnetic nanolaminated carbides -...

books.google.hr

J. Emmerlich, H. Hogberg, S. Sasvari, P.O.A. Persson, L. Hultman, J.-P. Palmquist , U. Jansson, J.M. Molina-Aldareguia, and Z. Czigany, "Growth of Ti3SiC2 thin ...

[PDF] Electronic structure investigation of Ti3AlC2, Ti3SiC2, and Ti3GeC2 ...www.diva-portal.org › smash › get › diva2: › FULLTEXT01

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M. Magnuson,1 J.-P. Palmquist,2 M. Mattesini,1,4 S. Li,1 R. Ahuja,1 O. Eriksson,1 J. Emmerlich,3 O. Wilhelmsson,2. P. Eklund,3 H. Högberg,3 L. Hultman,3 and ...

[PDF] Epitaxial growth of γ-Al2O3 on Ti2AlC(0001) by reactive high-power ...cyberleninka.org › article

cyberleninka.org

AP · 12 P. Eklund, C. Virojanadara, J. Emmerlich, L. I. Johansson, H. Högberg, and L. Hultman, Phys. Rev. B 74, (2006).

[PDF] High-pressure phase stability, mechanical properties and bonding ...kd.nsfc.gov.cn › paperDownload

kd.nsfc.gov.cn

AP · Eklund, J. Emmerlich, J. Birch, L. Hultman, J. Mater. Res (2005) 779.

[PDF] Influence of composition and structural properties in the tribological ...repositorium.sdum.uminho.pt › bitstream

repositorium.sdum.uminho.pt

[12] J. Emmerlich, G. Gassner, P. Eklund, H. Hogberg, L. Hultman, Micro and macroscale tribological behaviour of epitaxial Ti3SiC2 thin films, Wear 264.

Wikipedia: Hochleistungsimpulsmagnetronsputtern – Wikipedia

Das Hochenergieimpulsmagnetronsputtern (englisch high power impulse magnetron J. Alami, P. Eklund, J. Emmerlich, O. Wilhelmsson, U. Jansson, H. Högberg, L. Hultman, U. Helmersson: High-power impulse magnetron sputtering of ...

Dr. rer. nat. Aurelija Mockuté - Materials Discovery and Interfaceswww.mdi.ruhr-uni-bochum.de › mockute.html.de

www.mdi.ruhr-uni-bochum.de

AP · A. Mockute, M. Dahlqvist, J. Emmerlich, L. Hultman, J.M. Schneider, P.O.Å. Persson, J. Rosen (2013) Synthesis and ab initio calculations of ...

Effect of Si and C concentration on the microstructure, and the ...aip.scitation.org › doi › abs

aip.scitation.org

J. Alami, P. Eklund, J. Emmerlich, O. Wilhelmsson, U. Jansson, H. Hogberg, L. Hultman, and U. Helmersson, Thin Solid Films 515, (2006).

Structure and Properties of Pulsed-Laser Deposited Carbon Nitride ...pure.unileoben.ac.at › portal › publications

pure.unileoben.ac.at

Structure and Properties of Pulsed-Laser Deposited Carbon Nitride Thin Films. H. Riascos, Jörg Neidhardt, G.Z. Radnoczi, J. Emmerlich, G. Zambrano, Lars Hultman ...

Tribological performance evidence on ternary and quaternary nitride ...www.scielo.org.mx › scielo

www.scielo.org.mx

H. Riascos, J. Neidhardt, G.Z. Radnoczi, J. Emmerlich, G. Zambrano, L. Hultman, and P. Prieto, Thin Solid Films 497 (2006) 1. [ Links ].

[PDF] Growth and characterization of epitaxial Ti3GeC2 thin films on 4H ...www.tara.tcd.ie › bitstream › handle

www.tara.tcd.ie

AP · Eklund, J. Emmerlich, H. Högberg, T. Meehan, P. Finkel,. M.W. Barsoum, J.D. Hettinger, L. Hultman, S.E. Lofland, Solid ...

[PDF] Phase stability of epitaxially grown Ti2AlN thin films - HZDRwww.hzdr.de › FWI › Jahresbericht › Beckers

www.hzdr.de

Seppänen, J.-P. Palmquist, P. O. Å. Persson, J. Emmerlich, J. Molina, J. Birch, U. Jansson, P. Isberg, and L. Hultman, in Proceedings of the 53rd.

grupo de investigación sismicidad, sismotectónica y riesgo sísmicowww.ucm.es › gsismo › publicaciones

www.ucm.es

Eriksson, J. Emmerlich, O. Wilhelmsson, P. Eklund, H. Högberg, L. Hultman, and U. Jansson (2005). Electronic structure investigation of ...

H. Nowotny, Struktuchemie Einiger Verbindungen der ...

tel.archives-ouvertes.fr

H. Högberg, L. Hultman, J. Emmerlich, and T. Joelsson, Growth and characterization of MAXphase thin films, Surface & Coatings Technology,

J. Nick, K. Schweitzer, and P. Luxenberg ...

hal.archives-ouvertes.fr

H. Högberg, L. Hultman, J. Emmerlich, T. Joelsson, P. Elkund et al., Growth and characterisation of max-phase thin films, Surface & coatings technology, pp.6-10, ...

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