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A Disruptive Approach for Further Scaling - Monolithic 3Dwww.monolithic3d.com › blog

www.monolithic3d.com

Olivier Faynot, Leti's device department director and a well-known device scientist (with more than 170 papers/publications), entitled his talk ...

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www.monolithic3d.com

The lead talk was given by device scientist Olivier Faynot, Leti's Device Department Director. He titled his talk “M3D, a disruptive approach for further scaling,” and began with why the industry needs a solution for scaling. Most in the industry are in agreement that scaling past the 22nm node, while still quite ...

Concours de crèches: en attendant les résultats...

lesalonbeige.blogs.com

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Parting of the ways - Tech Design Forum Techniques

www.techdesignforums.com

Intel says ‘trigate’—finFET to others—but depleted silicon-on-insulator also has its post 22nm supporters. Chris Edwards reports on the debate at 2011’s...

Semiconductor Industry Workshop to Address Fully Depleted SOI...

forum.planet3dnow.de

Olivier Faynot of CEA-Leti Advanced FD-SOI Design by Bora Nikolic of the University of California-Berkeley ...

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